Wafer Image Registration Based on Hough Transform

Fei Tao; Ping An Mu; Shu Guang Dai

doi:10.4028/www.scientific.net/AMM.333-335.1038

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 333-335Wafer Image Registration Based on Hough Transform

Wafer Image Registration Based on Hough Transform

Abstract:

For wafer defects detection system in a certain resolution, CCD camera cannot get the whole wafer image at one-time, which has an influence on the subsequent defect feature extraction. This paper puts forward an image registration method based on geometry features. Firstly, the information of the image edge can be extracted by using an improved edge detection operator, then using Hough transform to extract the horizontal and vertical lines of the information of the image edge. Secondly, using the correlation of linear characteristic to define the registration standards of the image. A new method, simplex-simulated annealing algorithm, is presented to optimize the registration coefficient of the image. Finally the method is tested and evaluated by the matching effect, the results show that it can effectively achieve the automatic wafer image registration and has a good stability.

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Periodical:

Applied Mechanics and Materials (Volumes 333-335)

Pages:

1038-1042

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.333-335.1038

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Online since:

July 2013

Authors:

Fei Tao, Ping An Mu, Shu Guang Dai

Keywords:

Image Mosaic, Image Registration, Straight-Line Detection, Wafer

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