Size Control in ZnO Nanopillar Fabrication Using a Gel-Nanoimprint Process

Yasuaki Ishikawa; Shinji Araki; Min Zhang; Yukiharu Uraoka

doi:10.4028/www.scientific.net/AMM.372.149

Paper Titles

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Settling Characteristics of Alumina Nanoparticles in Ethanol-Water Mixtures
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Size Control in ZnO Nanopillar Fabrication Using a Gel-Nanoimprint Process
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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 372Size Control in ZnO Nanopillar Fabrication Using a...

Size Control in ZnO Nanopillar Fabrication Using a Gel-Nanoimprint Process

Abstract:

We evaluated size controllability and size error occurrence in fabrication of ZnO nanopillar pattern by gel-nanoimprint process. The ZnO nanopillar patterning yielding smaller size error than the conventional nanoimprint process was achieved. The UV-O₃ treatment was also proposed to make precise patterning, but we found that this treatment could not hold the nanostructure patterned, though the clear shape could be obtained just after the treatment.

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Applied Mechanics and Materials (Volume 372)

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149-152

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https://doi.org/10.4028/www.scientific.net/AMM.372.149

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Online since:

August 2013

Authors:

Yasuaki Ishikawa, Shinji Araki, Min Zhang, Yukiharu Uraoka

Keywords:

Nanoimprint, Nanostructure, Size Error, Sol-Gel

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References

[1] S. Y. Chou, P. R. Krauss, and P. J. Renstrom: Appl. Phys. Lett. 67 (1995) 3114.

Google Scholar

[2] M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson: Proc. SPIE 3676 (1999) 379.

DOI: 10.1117/12.351155

Google Scholar

[3] K. -Y. Yang, K. -M. Yoon, K. -W. Choi, and H. Lee: Microelectron. Eng. 86 (2009) 2228.

Google Scholar

[4] K. Yoon, K. Yang, and H. Lee: Thin Solid Films 518 (2009) 126.

Google Scholar

[5] Y. S. Kim, K. Y. Suh, and H. H. Lee: Appl. Phys. Lett. 79 (2001) 2285.

Google Scholar

[6] Y. Kang, M. Okada, C. Minari, K. Kanda, Y. Haruyama, and S. Matsui: Jpn. J. Appl. Phys. 49 (2007) 06GL13-1.

DOI: 10.1143/jjap.49.06gl13

Google Scholar

[7] S. Araki, Y. Ishikawa, M. Zhang, T. Doe, L. Lu, M. Horita, T. Nishida, and Y. Uraoka, Jpn. J. Appl. Phys. 52 (2013) 03BA02.

DOI: 10.7567/jjap.52.03ba02

Google Scholar

[8] Y. Kang, M. Okada, Y. Haruyama, K. Kanda, and S. Matsui, J. Photopolymer Sci. Tech. 23 (2010) 39.

Google Scholar