Preparation of Thermochromic Vanadium Dioxide Thin Films by Pulsed-Magnetron Sputtering

Abstract:

High quality VO₂ films have been successfully deposited by pulsed magnetron sputtering. In the preparation of vanadium dioxide films, the stoichiometry, structure and orientation of vanadium dioxide can be influenced by the process parameters. In this study, sputtering power and oxygen partial and substrate temperature were controlled accurately during experiment. Between X-ray diffraction and X-ray photoelectron spectroscopy were used to analyze the composition, phase structure, crystalline and valence state of the film. Atomic force spectroscopy was used to identify the film surface morphology. Electrical transition characteristics were also measured by four probes. Thermal radiative property was measured on a Calorimetric Emissometer. These investigations reveal that VO₂ films have high purity, monophase and the sharp variation of resistance of films from semiconductor to metal state at 293K~373K temperature. Thermal emissivity of VO₂ films vary widely from 0.82 to 0.35, which can meet requirement of future space thermal design.

• Periodical: Applied Mechanics and Materials (Volume 377)
• Pages: 227-231
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.377.227
• Online since: August 2013
• Authors: Min Xu, Jie Bing Wang, Lin Li, Chun Hua Wu, Yin Zhong Zhao, Hua Pin Zu
• Keywords: Electrical, Microstructure, Phase Transition, Pulsed-Sputter, Smart Thin Films, Thermal Property, VO₂

References

[1] F.J. Morin: Physical Review letters Vol. 3(1959), p.34.

[2] S.W. Lu, L. S Hou, F. X Gan: Journal of Material Science Vol. 28(1993), p.2169.

[3] F Cardillo Case: Journal of Vacuum Science and Technology A Vol. 2(4)(1984), p.1509.

[4] H K Kim, H You, R P Chiarello: Physical Revies B Vol. 47(19)(1993), p.12900.

[5] H.K. Kim, H. You, R.P. Chiarello, H.L.M. Chang and D.J. Lam: Phys. Rev. B Vol. 47(1993), p.12900.

[6] F.C. Case: Appl. Opt. Vol. 30(1991), p.4119.

[7] F.C. Case: J. Vac. Sci. Technol. A Vol. 5(1987), p.1762.

[8] K.D. Rogers, J. A. Coath and M. C. Lovell: J. Appl. Phys. Vol. 70(1991), p.1412.

[9] J.F. De Natale, P.J. Hood and A.B. Harker: J. Appl. Phys. Vol. 66(1989), p.5844.

[10] E.E. Chain: J. Vac. Sci. Technol. A Vol. 4(1986), p.432.

[11] S. Lu, L. Hou and F. Gan: J. Mater. Sci. Vol. 28(1993), p.2169.

[12] C.B. Greenberg: Thin Solid Films Vol. 73(1982), p.110.