Influence of Discharge Gas Pressure on Structural Properties of SnO2 Thin Films Deposited by Reactive Magnetron Sputtering

Yan Bai Shen; De Zhou Wei; Wen Gang Liu; Shu Ling Gao; Bao Yu Cui; Cong Han; Ming Yang Li; Rui Yang Zhang

doi:10.4028/www.scientific.net/AMM.377.217

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 377Influence of Discharge Gas Pressure on Structural...

Influence of Discharge Gas Pressure on Structural Properties of SnO₂ Thin Films Deposited by Reactive Magnetron Sputtering

Abstract:

The influence of discharge gas pressure on the structural properties of SnO₂ thin films deposited by reactive magnetron sputtering at room temperature was investigated by X-ray diffraction, field emission scanning electron microscopy, and by the measurement of film density and physical adsorption isotherms. As the pressure increased, the grain size increased and the crystallite size decreased; simultaneously, a void structure developed, and the film became porous, indicating a lower film density. According to the results of physical adsorption isotherms, the effective surface area and the porosity increased with increasing discharge gas pressure.

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Periodical:

Applied Mechanics and Materials (Volume 377)

Pages:

217-221

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.377.217

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Online since:

August 2013

Authors:

Yan Bai Shen, De Zhou Wei, Wen Gang Liu, Shu Ling Gao, Bao Yu Cui, Cong Han, Ming Yang Li, Rui Yang Zhang

Keywords:

Discharge Gas Pressure, Microstructure, Sputtering, Thin Film, TiN Oxide

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References

[1] Y.P. Yadava, G. Denicoló, A.C. Arias, L.S. Roman and I.A. Hümmelgen: Mater. Chem. Phys. Vol. 48 (1997), p.263.

Google Scholar

[2] D. Vaufrey, M. Ben Khalifa, M.P. Besland, C. Sandu, M.G. Blanchin, V. Teodorescu, J.A. Roger and J. Tardy: Synthetic Met. Vol. 127 (2002), p.207.

DOI: 10.1016/s0379-6779(01)00624-5

Google Scholar

[3] T. Yamazaki, H. Okumura, C.J. Jin, A. Nakayama, T. Kikuta and N. Nakatani: Vaccum Vol. 77 (2005), p.237.

Google Scholar

[4] Y. Shimizu, A. Jono, T. Hyodo and M. Egashira: Sens. Actuators B Vol. 108 (2005), p.56.

Google Scholar

[5] J.C. Chou and Y.F. Wang: Sens. Actuators B Vol. 86 (2002), p.58.

Google Scholar

[6] W.P. Tai and K. Inoue: Mater. Lett. Vol. 57 (2003), p.1508.

Google Scholar

[7] J.S. Lee, S.K. Sim, B. Min, K. Cho, S.W. Kim and S. Kim: J. Cryst. Growth Vol. 267 (2004), p.145.

Google Scholar

[8] Z. Ying, Q. Wan, Z.T. Song and S.L. Feng: Mater. Lett. Vol. 59 (2005), p.1670.

Google Scholar

[9] J.A. Thornton: J. Vac. Sci. Technol. A Vol. 4 (1986), p.3059.

Google Scholar

[10] J. A Thornton: J. Vac. Sci. Technol. A Vol. 12 (1975), p.830.

Google Scholar

[11] T. Yamazaki, T. Furuta, Y. B. Shen, C. J. Jin, T. Kikuta and N. Nakatani: Jpn. J. Appl. Phys. Vol. 45 (2006), p.9180.

Google Scholar

[12] A. Kunimoto, H. Tamura and T. Katsube: T. IEE Japan E Vol. 118 (1998), p.141.

Google Scholar

[13] Y. B. Shen, T. Yamazaki, Z. F. Liu, C. J. Jin, T. Kikuta and N. Nakatani: Thin Solid Films Vol. 516 (2008), p.5111.

DOI: 10.1016/j.tsf.2007.12.139

Google Scholar