The Planarization Technology of Optical Element Surface

Cheng Jun Guo; Ning Pei; Da Sen Wang; Feng Ming Nie; Guang Ping Zhang; Yu Peng Li

doi:10.4028/www.scientific.net/AMM.401-403.942

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The Double-Layer Matching Design of Broad-Band Foam Cement Absorbing Panel for Electromagnetic Pollution Control
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Research on Application of SLA Technology in the 3D Printing Technology
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The Planarization Technology of Optical Element Surface
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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 401-403The Planarization Technology of Optical Element...

The Planarization Technology of Optical Element Surface

Abstract:

The appropriate planarization layer is the foundation for realization of ion beam deposition correction polishing technology, the significant difference between ion beam deposition correction polishing technology and ordinary ion beam polishing, is using spin or methods of ion beam sputtering deposition, forming sediments which has planarization effect on the processing surface to reduce intermediate frequency error, coupled with ion beam polishing, removing the high-frequency processing error, the typical error is cut marks by single point diamond turning left on the component surface.

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Periodical:

Applied Mechanics and Materials (Volumes 401-403)

Pages:

942-945

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.401-403.942

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Online since:

September 2013

Authors:

Cheng Jun Guo, Ning Pei, Da Sen Wang, Feng Ming Nie, Guang Ping Zhang, Yu Peng Li

Keywords:

Correction, Deposition, Planarization, Polishing

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