Atmospheric Pressure Non-Equilibrium Plasma Deposition with Retention of Functional Group

Jun Yan; Yuki Kondo; Xiao Yi Qian; Xiao Meng Fei; Katsuhiko Hosoi; Tamio Mori; Shinichi Kuroda

doi:10.4028/www.scientific.net/AMM.423-426.537

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 423-426Atmospheric Pressure Non-Equilibrium Plasma...

Atmospheric Pressure Non-Equilibrium Plasma Deposition with Retention of Functional Group

Abstract:

A non-equilibrium atmospheric pressure plasma was applied for the polymerization of the methacrylic monomers such as (2-hydroxyethyl methacrylate (HEMA), methacrylic acid (MAA) and butyl methacrylate (BMA)). These monomers were successfully polymerized with retaining the functional groups of ester or acid. The polymerization mechanism was discussed on the basis of the optical emission spectroscopy (OES) of the plasma. It was strongly suggested that the functional groups could be retained in the polymerization proceeds when the HOMO-LUMO gap of the monomer is close to the energy of Ar metastable atom, which initiates the polymerization.

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Periodical:

Applied Mechanics and Materials (Volumes 423-426)

Pages:

537-540

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.423-426.537

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Online since:

September 2013

Authors:

Jun Yan, Yuki Kondo, Xiao Yi Qian, Xiao Meng Fei, Katsuhiko Hosoi, Tamio Mori, Shinichi Kuroda*

Keywords:

Ar Metastable, Atmospheric Pressure Plasma, Functional Group, HOMO-LUMO Gap, Methcrylic Monomers, Non-Equilibrium Plasma, Plasma Polymerization

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