Controlled Morphologies of Nanostructured ZnO Films by MOCVD Method

Abstract:

Metal-organic chemical vapor deposition (MOCVD) method has been applied to grow nanostructured ZnO films on Si (100) substrate at temperatures ranging from 200 to 550 °C. The as-prepared films were characterized by XRD, SEM, XPS analysis. The growth rate of ZnO films increases with increasing the deposition temperatures. The deposition temperatures have a drastic effect on the crystallinity and morphology of the nanostructured ZnO. Whisker shaped ZnO is formed at a temperature of 350 °C. The deposition time also affects the morphology of the particles. At 400 °C, sample with one hour deposition forms whisker shaped ZnO nanostructures whereas that of with two hours deposition forms flower-like nanostructures.

• Periodical: Applied Mechanics and Materials (Volume 492)
• Pages: 311-315
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.492.311
• Online since: January 2014
• Authors: Bashir Ahmmad, Kensaku Kanomata, Fumihiko Hirose
• Keywords: Chemical Vapor Deposition (CVD), Whisker, Zinc Oxide Film

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