Measurement of Growth Kinetics of Deeply Undercooled Zr50Cu50 Melt by Electromagnetic Levitation Technique

Li Xin Li; Jun Liang Zhao; Xue Mao Guan

doi:10.4028/www.scientific.net/AMM.513-517.56

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 513-517Measurement of Growth Kinetics of Deeply...

Measurement of Growth Kinetics of Deeply Undercooled Zr₅₀Cu₅₀ Melt by Electromagnetic Levitation Technique

Abstract:

The crystal growth kinetics in the deeply undercooled Zr₅₀Cu₅₀ melt was studied with the electromagnetic levitation technique. The maximum growth rate u_maxwas, for the first time, demonstrated in undercooled metal and alloy melts, and this allowed us to construct the complete profile of crystal growth kinetics in the whole undercooling region of Zr₅₀Cu₅₀ melt. In deep undercooling region near glass transition, the diffusion-controlled crystal growth mechanism accounted for the growth kinetics, while at lower undercooling the profile around u_max remarkably differed from what the classical growth theory covers.