Ultraviolet Laser Induced Damage Characteristic of SiO₂ Single Layers

Abstract:

Surface and subsurface defects of optics are of major concern in improving laser induced damage threshold. SiO₂ single layers were fabricated by physical vapor deposition and sol-gel technique on fused silica substrates. HF acid etching and ultrasonic cleaning process are used to investigate the effect of surface and subsurface defects of substrates on the laser induced damage threshold (1-on-1, 8 ns at 355nm). Experimental data are then fitted with the Gaussian model of threshold distribution, which permits to discriminate different kinds of defects and extract their densities and threshold distribution. The interpretation of these data is further discussed according to their cleaning and fabrication method.

• Periodical: Applied Mechanics and Materials (Volumes 513-517)
• Pages: 74-77
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.513-517.74
• Online since: February 2014
• Authors: Wei Sun*, Hong Ji Qi, Zhou Fang, Zhen Kun Yu, Hai Yuan Li
• Keywords: Fused Silica, Laser Induced Damage Threshold, Physical Vapor Deposition, SiO₂ Single Layer, Sol-Gel

References

[1] J. Fournier, J. Neauport, P. Grua, E. Fargin, V. Jubera, D. Talaga, S. Jouannigot. Green luminescence in silica glass: A possible indicator of subsurface fracture. Applied Physics Letters, 2012, 100: 114103.

DOI: 10.1063/1.3693393

[2] M. L. André. Status of the LMJ project, Proc. SPIE 1996, 3047: 38-42.

[3] W. H. Lowdermilk. Status of the National Ignition Facility project. Proc. SPIE 1996, 3047: 16–37.

[4] J. Fournier, P. Grua, J. Néauport, E. Fargin, V. Jubera, D. Talaga, A. Del Guerzo, G. Raffy, S. Jouannigot. Temperature dependence of luminescence for different surface flaws in high purity silica glass. Optical Materials Express, 2013, 3: 1-10.

DOI: 10.1364/ome.3.000001

[5] J. Neauport, P. Cormont, P. Legros, C. Ambard, J. Destribats. Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy. Optics Express, 2009, 17: 3543-3554.

DOI: 10.1364/oe.17.003543

[6] J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, J. -C. Birolleau. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm. Optics Express 2005, 13: 10163–10171.

DOI: 10.1364/opex.13.010163

[7] H. Bercegol, P. Grua, D. Hébert, J. P. Morreeuw. Progress in the understanding of fracture related laser damage of fused silica. Proc of SPIE 2007, 6720: 672003.

DOI: 10.1117/12.752830

[8] J. Shen, S. H. Liu, K. Yi, H. B. He, J. D. Shao, Z. X. Fan. Subsurface damage in optical substrates, Optik, 2005, 116: 288–294.

DOI: 10.1016/j.ijleo.2005.02.002

[9] H. Krol, L. Gallais, C. Grézes-Besset, J. -Y. Natoli, M. Commandré. Investigation of nanoprecursors threshold distribution in laser-damage testing, Optics Communications, 2005, 256: 184–189.

DOI: 10.1016/j.optcom.2005.06.059

[10] Z. M. Liao, M. L. Spaeth, K. Manes, J. J. Adams, C. W. Carr. Predicting laser-induced bulk damage and conditioning for deuterated potassium dihydrogen phosphate crystals using an absorption distribution model. Optics Letters, 2010, 35: 2538-3540.

DOI: 10.1364/ol.35.002538

[11] T. A. Laurence, J. D. Bude, S. Ly, N. Shen, M. D. Feit. Extracting the distribution of laser damage precursors on fused silica surfaces for 351 nm, 3 ns laser pulses at high fluences (20-150 J/cm2), Optics Express, 2012, 20: 11561-11573.

DOI: 10.1364/oe.20.011561

[12] Z. Zheng, X. T. Zu, X. D Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H Li, W. G. Zheng, L. Li. Effect of HF etching on the surface quality and laser-induced damage of fused silica, Optics & Laser Technology, 2012, 44: 1039–1042.

DOI: 10.1016/j.optlastec.2011.10.013