Characteristics of Electrophoretic Deposition-Assisted Polishing Using Bamboo Charcoal

Hsin Min Lee; Kun Ling Wu

doi:10.4028/www.scientific.net/AMM.575.264

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 575Characteristics of Electrophoretic...

Characteristics of Electrophoretic Deposition-Assisted Polishing Using Bamboo Charcoal

Abstract:

This study examines the feasibility of using high-porosity and conductive bamboo charcoal in electrophoretic deposition (EPD)-assisted polishing of silicon wafers and explored the influence of various parameters on surface roughness. EPD-assisted polishing with bamboo charcoal offers an alternative to the lapping process prior to CMP. According to the results, the best parameter combination obtained under the current experimental setting is machining time, 12 min; rotational speed of platen, 75 rpm; and voltage, 6V. EPD indeed contributes to more effective and efficient polishing, with better surface quality attained within a shorter machining time.

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Periodical:

Applied Mechanics and Materials (Volume 575)

Pages:

264-267

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.575.264

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Online since:

June 2014

Authors:

Hsin Min Lee*, Kun Ling Wu

Keywords:

Bamboo Charcoal, Electrophoretic Deposition (EPD), Lapping, Polishing, Roughness

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