Selective ZnO Nanorods Hydrothermal Growth through Resist Patterning Method

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Abstract:

Resist patterning method has been used to enable selective ZnO nanorods grown via facile hydrothermal process. The growth region of the ZnO nanorods was controlled by pre-coating the seed layer on the Silicon base substrate. Using the plasma process, the seed layer which is not coated with a resist layer will be etched out. Therefore, when the samples completely undergone the hydrothermal process, there will be no nanorods grow in that specific area. The grown ZnO nanorods was in well array with flat hexagonal tip and wurtzite crystal structure. This technique is can be applied for application which require integration of nanostructure in specific critical areas such as an interdigitated electrodes (IDE) for various gas sensor applications.

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51-54

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August 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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