Effects of Substrate Temperature on ZAO Thin Film Prepared by DC Reactive Magnetron Sputtering

Abstract:

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The effects of substrate temperature on the resistivity and transmittance of ZAO thin films prepared by DC magnetron reactive sputtering have been investigated. The properties of the samples have been analyzed through Hall effect, X-ray diffraction and SEM. The results show that carrier concentration, Hall mobility and crystallinity of the films depend obviously on the deposition temperature. The film deposited at the range 200-250°C has lower resistivity and higher transmittance.

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Periodical:

Edited by:

Zhenyu Du and Bin Liu

Pages:

376-380

DOI:

10.4028/www.scientific.net/AMM.65.376

Citation:

F. Lu and C. H. Xu, "Effects of Substrate Temperature on ZAO Thin Film Prepared by DC Reactive Magnetron Sputtering", Applied Mechanics and Materials, Vol. 65, pp. 376-380, 2011

Online since:

June 2011

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$35.00

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