Influence of Magnetron Sputtering and Annealing Treatment on the Organizational Properties of ZnO/SiO2 Composite Films

Yang Xu; Xiao Lei Cheng; Zhi Liu; Huan Ru Shi; Jian Ming Jian

doi:10.4028/www.scientific.net/AMM.66-68.1094

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 66-68Influence of Magnetron Sputtering and Annealing...

Influence of Magnetron Sputtering and Annealing Treatment on the Organizational Properties of ZnO/SiO₂ Composite Films

Abstract:

ZnO/SiO₂ composite films were deposited on Si substrate by RF magnetron sputtering technique and annealed in air .The influence of sputtering and annealing treatment conditions on the composition,the surface morphology and the wettability of the composite films was investigated by XRD, EDS, SEM and contact angle measurement. The results show that ZnO, SiO₂ and Zn₂SiO4 are main phases in the composite films existing by hexagonal wurtzite structure ,amorphous structure and willemite structure respectively. In this experimental conditions we get superior crystallization property of ZnO nanometer tissue with hexagonal wurtzite structure. The tissue shows bamboo leaf-like shape.The composite films has super hydrophobic,the contact angle is 146°.

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Periodical:

Applied Mechanics and Materials (Volumes 66-68)

Pages:

1094-1099

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.66-68.1094

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Online since:

July 2011

Authors:

Yang Xu, Xiao Lei Cheng, Zhi Liu, Huan Ru Shi, Jian Ming Jian

Keywords:

Annealing Treatment, Composite Film, Magnetron Sputtering, ZnO/SiO₂

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