Influence of Magnetron Sputtering and Annealing Treatment on the Organizational Properties of ZnO/SiO2 Composite Films

Abstract:

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ZnO/SiO2 composite films were deposited on Si substrate by RF magnetron sputtering technique and annealed in air .The influence of sputtering and annealing treatment conditions on the composition,the surface morphology and the wettability of the composite films was investigated by XRD, EDS, SEM and contact angle measurement. The results show that ZnO, SiO2 and Zn2SiO4 are main phases in the composite films existing by hexagonal wurtzite structure ,amorphous structure and willemite structure respectively. In this experimental conditions we get superior crystallization property of ZnO nanometer tissue with hexagonal wurtzite structure. The tissue shows bamboo leaf-like shape.The composite films has super hydrophobic,the contact angle is 146°.

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Periodical:

Edited by:

Honghua Tan

Pages:

1094-1099

DOI:

10.4028/www.scientific.net/AMM.66-68.1094

Citation:

Y. Xu et al., "Influence of Magnetron Sputtering and Annealing Treatment on the Organizational Properties of ZnO/SiO2 Composite Films", Applied Mechanics and Materials, Vols. 66-68, pp. 1094-1099, 2011

Online since:

July 2011

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$35.00

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