[1]
Horsfall AB, Santos JMM, Soare SM , Wright NG, O'Neill AG, Bull SJ, Walton AJ, Gundlach AM and Stevenson JTM. Direct measurement of residual stress in sub-micron interconnects. Semiconductor Science and Technology. 2003, 18(11): 992-996.
DOI: 10.1088/0268-1242/18/11/315
Google Scholar
[2]
Leto A, Porporati AA, Zhu WL, Green M and Pezzotti G. High-resolution stress assessments of interconnect/dielectric electronic patterns using optically active point defects of silica glass as a stress sensor. Journal of Applied Physics. 2007, 101: 093514-1-14.
DOI: 10.1063/1.2723193
Google Scholar
[3]
Bhaskaran, M, Sriram, S, Short, KT, Mitchell DRG, Holland AS and Reeves GK. Characterization of C54 titanium silicide thin films by spectroscopy, microscopy and diffraction. Journal of Physics D-Applied Physics. 2007, 40(17): 5213-5219.
DOI: 10.1088/0022-3727/40/17/030
Google Scholar
[4]
Malzbender J, Fischer W and Steinbrech RW. Studies of residual stresses in planar solid oxide fuel cells. Journal of Power Sources. 2008, 182(2): 594-598.
DOI: 10.1016/j.jpowsour.2008.04.035
Google Scholar
[5]
Wang QH, Xie HM, Liu ZW, Lou XH, Wang JF, Xu KW, Zhang ZH, Liao JH and Cu CZ. Residual stress assessment of interconnects by slot milling with FIB and geometric phase analysis. Optics and Lasers in Engineering. 2010, 48(11): 1113-1118.
DOI: 10.1016/j.optlaseng.2009.12.006
Google Scholar
[6]
Hytch MJ, Snoeck E and Kilaas R. Quantitative measurement of displacement and strain fields form HREM micrographs. Ultramicroscopy. 1998, 74: 131-146.
DOI: 10.1016/s0304-3991(98)00035-7
Google Scholar
[7]
Peters WH and Ranson WF. Digital imaging techniques in experimental stress analysis. Optical Engineering. 1982, 1: 427-431.
Google Scholar
[8]
Weller R and Shepherd BM. Displacement measurement by mechanical interferometry. Proceedings of the Society for Experimental Stress Analysis. 1948, 6 (1): 35–38.
Google Scholar
[9]
Kishimoto S, Egashira M, Shinya N. Micro-creep deformation measurement by a moiré method using electron beam lithography and electron beam scan. Optical Engineering. 1993, 32(2): 522.
DOI: 10.1117/12.61046
Google Scholar
[10]
Kishimoto S, Wang QH, Xie HM, Zhao YP. Study of the surface structure of butterfly wings using the scanning electron microscopic moiré method. Applied Optics. 2007, 46(28): 7026-7034.
DOI: 10.1364/ao.46.007026
Google Scholar
[11]
Shang HX, Xie HM, Liu ZW, Guo HM and Gao HJ. Phase shifting nano-moiré method with scanning tunneling microscope. Optics and Lasers in Engineering. 2004, 41(5): 755–765.
DOI: 10.1016/s0143-8166(03)00030-7
Google Scholar
[12]
Yu meiwen. Optical Holography and Information Processing. Peking, China: Defence Industry Press. 1983, 8: 193-195.
Google Scholar
[13]
Hu ZX, Xie HM, Lu Jian, Liu ZW and Wang QH. A new method for the reconstruction of micro- and nanoscale planar periodic structures. Ultramicroscopy. 2010, 110(9): 1223-1230.
DOI: 10.1016/j.ultramic.2010.05.009
Google Scholar
[14]
Wang Z and Han B. Advanced iterative algorithm for phase extraction of randomly phase-shiftedinterferograms. Optics Letters. 2004, 29(14): 1671-1673.
DOI: 10.1364/ol.29.001671
Google Scholar
[15]
Ghiglia DC and Romero LA. Robust two-dimensional weighted and unweighted phase unwrapping that uses fast transforms and iterative methods. Journal of the Optical Society of America A. 1994, 11(1): 107-117.
DOI: 10.1364/josaa.11.000107
Google Scholar