Dynamic Friction Polishing of Diamond Utilizing High Reactive Metallic Tools

William Chen; Manabu Iwai; Kiyoshi Suzuki

doi:10.4028/www.scientific.net/AMR.1017.160

Paper Titles

Development of Non-Destructive Inspection System for Grinding Burn-in-Process Detection of Grinding Burn
p.135

Feature Extraction Based 3D Model Registration for Surface Finish Quality Evaluation
p.141

Dry Sliding Wear Behaviour of Full Pearlite Obtained by Cladding Low Carbon Steel to Hypoeutectoid Steel
p.147

Material Properties of a New PCD Made of Boron Doped Diamond Particles
p.154

Dynamic Friction Polishing of Diamond Utilizing High Reactive Metallic Tools
p.160

Evaluation and ANN-Based Prediction on Functional Parameters of Surface Roughness in Precision Grinding of Cast Iron
p.166

An Experimental Study on Single Point Diamond Turning of an Unpolished Silicon Wafer via Micro-Laser Assisted Machining
p.175

Effect of Cutting Fluid on Diamond Tool Life under Micro V-Groove Turning of Cobalt-Free Tungsten Carbide
p.181

A Three-Dimensional Fractal Analysis Method for Ground Monocrystal Sapphire Surface
p.187

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1017Dynamic Friction Polishing of Diamond Utilizing...

Dynamic Friction Polishing of Diamond Utilizing High Reactive Metallic Tools

Abstract:

The authors developed “Dynamic Friction Polishing (DF polishing) Method” utilizing a thermochemical reaction between a diamond workpiece and a metal. This method enables high efficiency abrasive-free polishing of single crystal and polycrystalline diamonds (PCD) by simply pressing them against a stainless steel (SUS304) disc rotating at a high peripheral speed (V_S>2500m/min). In the authors’ previous paper, a top of the diamond test piece (0.6mm×0.6mm, (100) plane) was removed at a rate of 2.6mm/min (0.94mm³/min) under the polishing condition of sliding speed V_S=4000m/min, loading pressure P=130MPa and polishing time t=10s. A bottleneck for practical use of this method is a high pressure over 100MPa required for pressing a diamond workpiece against a rotating stainless steel disc. In this paper, a high efficiency tool was manufactured by electro-spark deposition of highly reactive special metals on a base disc tool. Among various reactive metals Nb and W brought very high efficiency in the polishing of a single crystal diamond.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 1017)

Pages:

160-165

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1017.160

Citation:

Cite this paper

Online since:

September 2014

Authors:

William Chen*, Manabu Iwai, Kiyoshi Suzuki

Keywords:

Abrasive-Free Polishing, Diamond, Dynamic Friction Polishing Method, Thermochemical

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

* - Corresponding Author

References

[1] C.F. Yang, M. Yoshikawa: On polishing of diamond film with hot metal (The optimum polishing condition), Journal of JSPE, 57-1 (1991) 184-189 (in Japanese).

Google Scholar

[2] T. Nakano, A. Miyoshi, M. Touge, J. Watanabe: Ultra-precision machining of PCD by UV-assisted polishing, Journal of Japan Society for Abrasive Technology, Vol. 53, No. 4 (2009) pp.242-247. (in Japanese).

Google Scholar

[3] K. Suzuki, N. Yasunaga, S. Miyake, T. Uematsu et al.: Dynamic friction polishing of diamond - 1st report, Proc. of Spring Conf. of JSPE (1995) pp.499-500 (in Japanese).

Google Scholar

[4] M. Iwai, T. Uematsu, K. Suzuki, N. Yasunaga: High efficiency polishing of PCD with rotating metal disc, Proc. of ISAAT2001, Advances in Abrasive Technology IV (2001) pp.231-238.

Google Scholar

[5] K. Suzuki, M. Iwai, T. Uematsu, N. Yasunaga : Material Removal Mechanism in Dynamic Friction Polishing of Diamond, Key Engineering Materials Vols. 238-239, Advances in Abrasive Technology V (2003) pp.235-240.

DOI: 10.4028/www.scientific.net/kem.238-239.235

Google Scholar