Hydration Polishing of Sapphire

Jian Lin Wu; Wei Fang Wang; Peng Fei Gao; Dong Hui Wen

doi:10.4028/www.scientific.net/AMR.102-104.695

Paper Titles

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Study on a Three-Dimension Nanometer Precision Machining
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Application of Magnetic Abrasive in Gasbag Polishing
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Hydration Polishing of Sapphire
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Study on the Multiple Objective Parameter Optimization Method for NC Turning
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Research on Laminated Object Manufacturing Technology for Metal Part Based on CNC Machine Tool and Large Thickness Slice
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Research on Precision Accelerant Lapping Technology of GHz SAW CVD Diamond Films
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 102-104Hydration Polishing of Sapphire

Hydration Polishing of Sapphire

Abstract:

This paper discussed the polishing characteristic of single crystal sapphire (0001) when using 100°C vapor as polishing liquid and cedar wood as polishing pad. Surface roughness and scratch were compared before and after hydration polishing process. For 20 hours hydration polishing, both XRD and surface texture show that sapphire surface was changed in micro-structure and texture, even with minor scratch on the hydration polished surface, surface roughness could be decreased to Rt6.74 in X direction and Rt7.64nm in Y direction, it is about 2 nm surface layer was removed during hydration polishing.