Simulation of Temperature Distribution in HFCVD Diamond Films Growth on the End Surfaces of Seals

Abstract:

The uniform temperature flied of substrates is a key factor to deposit high-quality diamond films on milling tools by the hot filament chemical vapor deposition (HFCVD). In this study, a 3-D computational model is established to simulate the temperature distribution on the substrates. Thereafter, the influence of the rotational speed of worktable n and the water flux of water-cooled worktable Q are investigated. The simulation results show that the increasing of the rotational speed of worktable is suitable to grow homogeneous diamond films and gently decrease the even temperature of seals. What’s more, the deceasing of the water flux will significantly increase the overall temperature of seals.

• Periodical: Advanced Materials Research (Volume 1027)
• Pages: 195-198
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1027.195
• Online since: October 2014
• Authors: Jian Jin Liu, Bo Song, Tao Zhang, Fang Hong Sun*
• Keywords: Finite Volume Method (FVM), HFCVD, Simulation, Substrate Temperature

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