In2O3-Based Thin Films Deposited by Spray Pyrolysis as Promising Thermoelectric Material

Ghenadii Korotcenkov; V. Brinzari; L. Trakhtenberg; B.K. Cho

doi:10.4028/www.scientific.net/AMR.1043.40

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1043In2O3-Based Thin Films Deposited by Spray...

In₂O₃-Based Thin Films Deposited by Spray Pyrolysis as Promising Thermoelectric Material

Abstract:

Structural, electrophysical and thermoelectric properties of nanoscaled In₂O₃ films doped by Sn and Zn were studied. Thin films based on In₂O₃-SnO₂ and In₂O₃-SnO₂-ZnO systems were prepared by spray pyrolysis method from water solutions of metal chlorides. It was confirmed that In₂O₃-based films, especially the In₂O₃:Sn ones, are promising material for applications related to thermoelectricity. The power factor of obtained films was found to be on the level of the best samples prepared on the base of ITO system.

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Periodical:

Advanced Materials Research (Volume 1043)

Pages:

40-44

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1043.40

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Online since:

October 2014

Authors:

Ghenadii Korotcenkov*, V. Brinzari, L. Trakhtenberg, B.K. Cho

Keywords:

Indium Oxide Doped by Tin, Spray Pyrolysis, Thermoelectric Properties, Thin Film

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