[1]
E. Yousfi , T. Asikainen, V. Pietu , P. Cowache, M. Powalla, D. Lincot, Cadmium-free buffer layers deposited by atomic layer epitaxy for copper indium diselenide solar cells. Thin Solid Films. 361 (2000)183–186.
DOI: 10.1016/s0040-6090(99)00860-3
Google Scholar
[2]
J. Kessler, J. Wennerberg, M. Bodegard, L. Stolt, Highly efficient Cu(In, Ga)Se2 mini-modules. Sol. Ene. Mat. & Sol. Cells. 75 (2003) 35–46.
DOI: 10.1016/s0927-0248(02)00102-2
Google Scholar
[3]
S.K. Gupta, P.K. Jha, Solid State Commun. 149(2009)1989-1992; S. Siebentritt, Alternative buffers for chalcopyrite solar cells. Sol. Ene. 77 (2004) 767–775.
DOI: 10.1016/j.solener.2004.06.018
Google Scholar
[4]
I. Lauermann, C. Loreck, A. Grimm, R. Klenk, H. Monig, M.C. Lux-Steiner , C. Fischer , S. Visbeck, T. Niesen, Cu-accumulation at the interface between sputter-(Zn, Mg)O and Cu(In, Ga)(S, Se)2 – A key to understanding the need for buffer layers. Thin Solid Films. 515 (2007).
DOI: 10.1016/j.tsf.2006.12.172
Google Scholar
[5]
C. H. Fischer, M. Bar, T. Glatzel, I. Lauermann, M.C. Lux-Steiner, Interface engineering in chalcopyrite thin film solar devices. Sol. Ene. Mat. & Sol. Cells 90 (2006) 1471–1485.
DOI: 10.1016/j.solmat.2005.10.012
Google Scholar
[6]
D. Abou-Ras , G. Kostorz ,D. Hariskos, R. Menner, M. Powalla, S. Schorr, A. N. Tiwari, Structural and chemical analyses of sputtered InxSy buffer layers in Cu(In, Ga)Se2 thin-film solar cells. Thin Solid Films 517 (2009) 2792–2798.
DOI: 10.1016/j.tsf.2008.10.138
Google Scholar
[7]
I. Repins, M.A. Contreras, B. Egaas, C. DeHart, J. Scharf, C.L. Perkins, B. To , R. Noufi, 19. 9%-Efficient ZnO/ CdS/CuInGaSe2 solar cell with 81. 2% fill factor. Prog. Photovol.: Res. and Appl. 16 (2008) 235–239.
DOI: 10.1002/pip.822
Google Scholar
[8]
O. Kluth, G. Schoepe, B. Rech, R. Menner, M. Oertel, K. Orgassa, H. W. Schock, Comparative material study on RF and DC magnetron sputtered ZnO: Al films. Thin Solid films 502 (2006) 311–316.
DOI: 10.1016/j.tsf.2005.07.313
Google Scholar
[9]
D. Herrmann, M. Oertel, R. Menner, M. Powalla . Analysis of relevant plasma parameters for ZnO: Al film deposition based on data from reactive and nonreactive DC magnetron sputtering. Surf. and Coatings Tech. 174 (2003) 229–234.
DOI: 10.1016/s0257-8972(03)00524-3
Google Scholar