Electrochemical Behavior of Mg in H3PO4 and Phosphating Solution

Dao Bing Huang; Yuan Qiang Tu; Ting Hu; Guang Ling Song; Xing Peng Guo

doi:10.4028/www.scientific.net/AMR.1081.318

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1081Electrochemical Behavior of Mg in H3PO4 and...

Electrochemical Behavior of Mg in H₃PO₄ and Phosphating Solution

Abstract:

The electrochemical behavior of pure Mg in H₃PO₄ acid (0.42 M) and phosphating solution (0.42 M H₃PO₄+0.34 M ZnO) was investigated through electrochemical impedance spectroscopy (EIS), potentiodynamic polarization curve and XRD measurements. The results show that Mg has higher corrosion resistance in the phosphating solution than that in the H₃PO₄ acid which may be due to the relative protective phosphating film on the surface.

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Periodical:

Advanced Materials Research (Volume 1081)

Pages:

318-321

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1081.318

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Online since:

December 2014

Authors:

Dao Bing Huang*, Yuan Qiang Tu, Ting Hu, Guang Ling Song, Xing Peng Guo

Keywords:

Corrosion, Mg, Phosphating

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