Effect of Flexible Substrates on the Structural and Optical Properties of ZnO Films Deposited by Sputtering Method

Abstract:

Zinc Oxide (ZnO) has attracted much attention because of its high optical transmittance approximately ~80 % with a wide band gap of (3.3 eV at 300 K) and a relatively low cost material. ZnO thin films were deposited on plastic substrate using RF powered magnetron sputtering method. The target used is ZnO disk with 99.99 % purity. The sputtering processes are carried out with argon gas that flow from 10-15 sccm. Argon is used to sputter the ZnO target because the ability of argon that can remove ZnO layer effectively by sputtering with argon plasma bombardment. The deposited ZnO thin films are characterized using X-Ray Diffraction (XRD) and UV-Vis Spectrometer. The analysis of X-ray diffraction show that good crystalline quality occurs at nominal thickness of 400 nm. The optical studies showed that all the thin films have high average transmittance of approximately 80 % and the estimated value of optical band gap is within 3.1 eV-3.3 eV range.

• Periodical: Advanced Materials Research (Volume 1107)
• Pages: 678-683
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1107.678
• Online since: June 2015
• Authors: Lam Mui Li, Azmizam Manie Mani, Saafie Salleh, Afishah Alias
• Keywords: Flexible Substrates, RF Powered Magnetron Sputtering, ZNO

References

[1] Su Shia Lin, Jow Lay Huang. 2004. Effect of the thickness on the structural and optical properties of ZnO films by r. f. magnetron sputtering. Surface & Coatings Technology 185 (2004) 222-227.

DOI: 10.1016/j.surfcoat.2003.11.014

[2] J. J. Kim, J. H. Lee, J. Y. Lee, D. J. Lee, B. R. Jang and H. S. Kim. 2009. Characteristics of ZnO films deposited on plastic substrates at various rf sputtering powers. Journal of the Korean Physical Society, Vol. 55, No. 5, November 2009, p.1910~(1914).

DOI: 10.3938/jkps.55.1910

[3] Petronela Prepelita, R. Medianu, Beatrice Sbarcea, F. Garoi, Mihaela Filipescu. 2010. The influence of using different substrates on the structural and optical characteristics of ZnO thin films. Applied Surface Science 256 (2010) 1807-1811.

DOI: 10.1016/j.apsusc.2009.10.011

[4] Ismail, A., & Abdullah, M. J. 2013. The structural and optical properties of ZnO thin films prepared at different RF sputtering power. Journal of King Saud University.

DOI: 10.1016/j.jksus.2012.12.004

[5] C. Gumus, O. M. Ozkendir, H. Kavak, Y. Ufuktepe. 2006. Structural and optical properties of zinc oxide thin films prepared by spray pyrolysis method. Journal of optoelectronics and advanced materials. Vol. 8, No. 1, February 2006, pp.299-303.

[6] Hyung, G. W., Park, J., Koo, J. R., Choi, K. M., Kwon, S. J., Cho, E. S., Kim, Y. S., & Kim, Y. K. 2012. ZnO thin-film transistors with a polymeris gate insulator built on a polyethersulfone substrate. Solid state electronics 69 (2012) 27-30.

DOI: 10.1016/j.sse.2011.12.001

[7] G. Srinivasan, J. Kumar. Optical and structural characterization of zinc oxide thin films prepared by sol-gel process, Cryst. Res. Technol. 41 (2006) 893-896.

DOI: 10.1002/crat.200510690

[8] M. Fahoume, O. Maghfoul, M. Aggour, B. Hartiti, F. Chraibi, A. Ennaoni, Growth and characterization of ZnO thin films prepared by electrodeposition technique, Sol. Energy Mater. Sol. Cells 90 (2006) 1437-1444.

DOI: 10.1016/j.solmat.2005.10.010

[9] T. Terasako, M. Yagi, M. Ishizaki, Y. Senda, H. Matsuura, S. Shirakata. Growth of zinc oxide films and nanowires by atmospheric-pressure chemical vapor deposition using zinc powder and water as source materials, Surf. Coat. Technol. 201 (2007).

DOI: 10.1016/j.surfcoat.2007.04.017

[10] F. K. Shan, Y. S. Yu. Optical properties of pure and Al doped ZnO thin films fabricated with plasma produced by excimer laser. Thin Solid Films 435 (2003) 174-178.

DOI: 10.1016/s0040-6090(03)00343-2

[11] R. Ondo-Ndong, F. Pascal-Delannoy, A. Boyer, A. Giani, A. Foucaran. Structural properties of zinc oxide thin films prepared by r. f. magnetron sputtering. Materials Science and Engineering B97 (2003) 68-73.

DOI: 10.1016/s0921-5107(02)00406-3

[12] C. Guillen, J. Herrero. Optical, electrical and structural characteristics of Al: ZnO thin films with various thicknesses deposited by DC sputtering at room temperature and annealed in air or vacuum. Vacuum 84 (2010) 924-929.

DOI: 10.1016/j.vacuum.2009.12.015

[13] Tsai, S. Y., Yang, M. L., Jeng, J. L., & Min, H. H. 2006. Comparison with electrical and optical properties of zinc oxide films deposited on the glass and PET substrates. Surface & Coatings Technology 200, 3241-3244.

DOI: 10.1016/j.surfcoat.2005.07.022

[14] R. Subba Reddy, A. Sreedhar, A. Sivasankar Reddy & S. Uthanna. Effect of film thickness on the structural morphological and optical properties of nanocrystalline ZnO films formed by RF magnetron sputtering. Advanced Materials Letters. 2012, 3(3), 239-245.

DOI: 10.5185/amlett.2012.3329

[15] M. Bouderbala, S. Hamzaoui, B. Amrani, Ali H. Reshak, M. Adnane, T. Sahraoui, M. Zerdali. Thickness dependence of structural, electrical and optical behavior of undoped ZnO thin films. Physica B 403 (2008) 3326-3330.

DOI: 10.1016/j.physb.2008.04.045