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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1107Structural Properties of Al2O3:C:Mg Thin Films by...

Structural Properties of Al₂O₃:C:Mg Thin Films by RF Magnetron Sputtering

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Abstract:

Carbon doped aluminum oxide co-doped with magnesium (Al₂O₃:C:Mg) thin films were deposited using radio frequency magnetron sputtering method on Si (100) substrates. The deposition chamber temperature was manipulated to allow control over the crystalline phase. The crystalline phase of deposited thin films were determined by x-ray diffraction (XRD) technique. Slight change in crystallite size was observed with respect to the increasing deposition chamber temperature. Fourier transform infrared (FTIR) analyses indicated a negligible interfacial SiO₂ growth during deposition. Transmission spectra of FTIR showed the bond and functional group of deposited thin films.

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Periodical:

Advanced Materials Research (Volume 1107)

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661-666

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https://doi.org/10.4028/www.scientific.net/AMR.1107.661

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Online since:

June 2015

Authors:

Ainun Jariah Awang, Husin Wagiran*, Abd Khamim Ismail

Keywords:

Aluminum Oxide, FTIR, RF Sputtering, XRD

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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