Structural, Optical and Electrical Properties of Multiple Layers Nano-Structured Zinc Oxide Thin Film

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The nanoStructured ZnO thin films were prepared by Spin coating technique on glass substrates at various layers. The structural and optical properties were characterized by field emission scanning electron microscopy (FESEM) and UV-Vis-NIR respectively. The surface morphology reveals that the nanostructured ZnO thin films become densely packed as the thickness increased. The average particles size of ZnO thin film estimated from FESEM images at different layers of 1, 3, 5, 7, 9 were 20nm, 28nm, 36nm, 39nm and 56nm, respectively. The surface roughness of thin films was increase as the thin film thickness increases. The results show all films are transparent in the visible region (400-800 nm) with average transmittance above 85 %. Meanwhile, the optical band gap was decrease as the film thickness increases. The conductivity of ZnO thin film slightly improved as the thickness increased as measured through two probes 1-V measurement system.

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401-404

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June 2015

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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[1] M. Liao, C. Hsu and D. Chen, Preparation and properties of amorphous titania-coated zinc oxide nanoparticles, Journal of Solid State Chemical, 179 (2006) 2020-2026.

DOI: 10.1016/j.jssc.2006.03.042

Google Scholar

[2] H. Wang, Z. Wu, Y. Liu, Z. Sheng, The characterization of ZnO-Anatase-Rutile three components semiconductor and enhanced photocatalytic activity of nitrogen oxides, J.Mol Catal, A: Chem. 287 (2008) 176-181.

DOI: 10.1016/j.molcata.2008.03.010

Google Scholar

[3] D. wei, Dye-sensitized solar cell review, Int. J. Mol. Sci. 2, 11 (2010) 1103-1113.

Google Scholar

[4] S.H. Jeong, J.W. Lee, S.B. Lee and J.H. Boo, Deposition of aluminum-doped zinc oxide films by RF Magnetron sputtering and study of their structural, electrical and optical properties,Thin solid Films, 435 (2003) 78-82.

DOI: 10.1016/s0040-6090(03)00376-6

Google Scholar

[5] S.W. Xue, X.T. Zu, L.X. Shao, Z.L. Yuan, W.G. Zheng, X.D. Jiang and H. Deng, Effects of annealing on optical properties of Zn-implanted ZnO thin films, Journal of Alloys and Compounds, 458 (2008) 572.

DOI: 10.1016/j.jallcom.2007.04.239

Google Scholar

[6] S. Youssef, P. Combette, J. Podlecki, R. A. Asmar and A. Foucaran, Structural and Optical Characterization of ZnO Thin Films Deposited by Reactive rf Magnetron Sputtering, Crystal Grown and Design, 9 (2009) 1088-1094.

DOI: 10.1021/cg800905e

Google Scholar

[7] L. Xu, X. Li, Y. Chen and F. Xu, Structural and optical properties of ZnO thin films prepared by sol-gel method with diffrerent thickness, Applied Surface Science, 257 (2011) 4031-4037.

DOI: 10.1016/j.apsusc.2010.11.170

Google Scholar

[8] E. Bacaksiz, Structural, optical and electrical properties of Al-doped ZnO microrods prepared by spray pyrolysis, Thin Solid Films, 518 (2010) 4076-4080.

DOI: 10.1016/j.tsf.2009.10.141

Google Scholar

[9] M. Ali Yildirim and A. Ated, Influence of films thickness and structure on the photo-response of ZnO films, Optics Communications, 283 (2010) 1370-1377.

DOI: 10.1016/j.optcom.2009.12.009

Google Scholar