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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 1120-1121Nanocrystalline Diamond Film Deposited by Double...

Nanocrystalline Diamond Film Deposited by Double Bias-Voltage Assited HF-PECVD System

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Abstract:

A new process has been developed to obtain high density nanocrystalline diamond (NCD) film via a double bias voltage hot filament-assisted plasma enhanced chemical vapor deposition (HF-PECVD). The microstructure and characterization of the film were analysed by SEM, Raman and AFM. The results show that the NCD film has higher nucleation density and smooth surface, the nanocrysatalline size was in diameter of about 40 nm. Three Raman band near 1150m^-1, 1330 cm^-1 and 1590m^-1 lie in the specrum. The growth mechanism of naocrystalline diamond film was analysized at last.

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Periodical:

Advanced Materials Research (Volumes 1120-1121)

Pages:

243-248

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1120-1121.243

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Online since:

July 2015

Authors:

Yong Zhang, En Lei Zhang*, Zhao Long Lin

Keywords:

AFM, Double Bias-Voltage, HF-PECVD, Nanocrystalline Diamond Film, RAMAN

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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