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Highly Response and Sensitive Copper Sensors Based on Chitosan Films

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Abstract:

Discharge of metal containing effluents into water has been a major concern. Traditional detecting methods were proven to be ineffective and expensive. This paper proposes the use of chitosan film as a highly response and sensitive film sensor towards Cu ion due to its positive charge and electrical characteristic. Chitosan film was deposited by using electrochemical deposition technique. Different deposition times were applied to study the effect of deposition time on sensing properties of chitosan films, in which the best performance time of 90 seconds was recorded. This study was carried out to investigate the sensing performance of chitosan films toward variation concentrations of copper ion. Contaminated air exposure technique was used in this work to detect the concentrations of copper ion. The chitosan film sensors showed different sensor output toward deionized water and 0.005 M, 0.01M, 0.05M, 0.1M copper ions. The results showed that chitosan films had good sensitivity, fast response, stable and excellent recovery time. Scanning electron microscopy was employed to characterize chitosan film structure.

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Periodical:

Advanced Materials Research (Volume 1125)

Pages:

255-259

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1125.255

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Online since:

October 2015

Authors:

Ahmed Eljali, Irwana Nainggolan*, Shahrir Hashim, Tulus Ikhsan Nasution

Keywords:

Chitosan Film, Copper, Electrochemical Deposition, Heavy Metal Sensor

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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