Investigation on Micro Defects of the Protective Coating SiOx in Mass Manufacturing Processes

Rong Wang; Li Sha Li; Jin Yue Gao; Hai Ning Cui

doi:10.4028/www.scientific.net/AMR.148-149.443

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The Superplastic Deformation and Microstructural Analysis of Fine-Grained 1420 Al-Li Alloy
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 148-149Investigation on Micro Defects of the Protective...

Investigation on Micro Defects of the Protective Coating SiOx in Mass Manufacturing Processes

Abstract:

A transparent hard coating of silicon oxide (SiOx) deposited by using plasma enhanced chemical vapour deposition (PECVD) can protect the surfaces of plastics and metals. This coating has good adhesion, good wear-resistance and environmental resistance. Our work is to optimize this protective organosilicon film in an industry manufacturing process for the metal cover of mobile phones and plastic lenses. Investigation of the failures of the film and analysis of the defect in deposited films by means of the optical microscope and atomic force microscope (AFM) shows that mechanism of the micro defect with Newton color rings.

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Periodical:

Advanced Materials Research (Volumes 148-149)

Pages:

443-448

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.148-149.443

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Online since:

October 2010

Authors:

Rong Wang, Li Sha Li, Jin Yue Gao, Hai Ning Cui

Keywords:

Hexamethyldisiloxane, Manufacturing Process, PECVD, Silicon Oxide Film

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