Effect of Film Thickness on Structure and Property of Pb(Zr0.53Ti0.47)O3 Thin Film

Abstract:

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Pb(Zr0.53Ti0.47)O3 thin films with thickness of 120nm, 190nm, 310nm, 440nm and 630nm were deposited on Pt/Ti/SiO2/Si substrates by sol-gel process through repeating spining process 2 times, 4 times, 6 times, 8 times and 10 times respectively. The structures of PZT films were investigated by SEM and XRD analysis. The ferroelectric hysteresis loops were recorded by Radiant Precision Workstation and dielectric properties were measured using an Agilent HP4294A impedance analyzer. X-ray diffraction indicated that with the film thickness increasing, the diffraction intensity increased. The thickness of PZT film had great effect on ferroelectric and dielectric properties. Conclusively when the film thickness was about 310nm, the PZT thin films possessed better ferroelectric and dielectric properties.

Info:

Periodical:

Advanced Materials Research (Volumes 150-151)

Edited by:

Jinglong Bu, Zhengyi Jiang and Sihai Jiao

Pages:

112-117

DOI:

10.4028/www.scientific.net/AMR.150-151.112

Citation:

M. X. Shi et al., "Effect of Film Thickness on Structure and Property of Pb(Zr0.53Ti0.47)O3 Thin Film", Advanced Materials Research, Vols. 150-151, pp. 112-117, 2011

Online since:

October 2010

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Price:

$35.00

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