Analysis on Photoelectric Method of Measuring the Fineness of Raw Silk

Abstract:

Article Preview

In order to precisely measure the fineness of raw silk, some features of raw silk are analyzed. By use of Fresnel principle, diffractions caused by raw silk in different conditions are analyzed and simulated. Image data of the fineness of raw silk measured by CMOS image sensor is analyzed for obtaining precise result. Finally, some suggestions are proposed for photoelectric measuring the fineness of raw silk.

Info:

Periodical:

Advanced Materials Research (Volumes 175-176)

Main Theme:

Edited by:

Lun Bai and Guo-Qiang Chen

Pages:

565-569

DOI:

10.4028/www.scientific.net/AMR.175-176.565

Citation:

W. C. Fei et al., "Analysis on Photoelectric Method of Measuring the Fineness of Raw Silk", Advanced Materials Research, Vols. 175-176, pp. 565-569, 2011

Online since:

January 2011

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.