Analysis on Photoelectric Method of Measuring the Fineness of Raw Silk

Wan Chun Fei; Yu Guang Zheng; Wei Li; Xing Xing Lu

doi:10.4028/www.scientific.net/AMR.175-176.565

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 175-176Analysis on Photoelectric Method of Measuring the...

Analysis on Photoelectric Method of Measuring the Fineness of Raw Silk

Abstract:

In order to precisely measure the fineness of raw silk, some features of raw silk are analyzed. By use of Fresnel principle, diffractions caused by raw silk in different conditions are analyzed and simulated. Image data of the fineness of raw silk measured by CMOS image sensor is analyzed for obtaining precise result. Finally, some suggestions are proposed for photoelectric measuring the fineness of raw silk.

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Periodical:

Advanced Materials Research (Volumes 175-176)

Pages:

565-569

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.175-176.565

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Online since:

January 2011

Authors:

Wan Chun Fei, Yu Guang Zheng, Wei Li, Xing Xing Lu

Keywords:

Fineness of Raw Silk, Image Processing, Photoelectric Measurement, Simulation

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References

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