Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

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Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

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Periodical:

Advanced Materials Research (Volumes 189-193)

Edited by:

Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang

Pages:

668-671

Citation:

M. S. Li et al., "Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage", Advanced Materials Research, Vols. 189-193, pp. 668-671, 2011

Online since:

February 2011

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$41.00

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