Realization of Three-Dimensional Nanostructure Fabrication by Nanoimprint on Silicon Substrate

Abstract:

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Traditional optical lithography techniques to fabricate three-dimensional (3D) nanostructures are complicated and time consuming. Due to the capability to replicate nanostructures repeatedly in a large area with high resolution and uniformity, nanoimprint (NI) has been recognized as one of the promising approaches to fabricate 3-D nanostructures with high throughput and low cost. This paper introduces a novel 3-D nanostructure fabrication method by nanoimprint on silicon substrate. Nanoscale gratings and microlens array are taken as examples of 3-D nanostructures fabricated by nanoimprint. High fidelity demonstrates the possibility of nanoimprint to fabricate 3-D nanostructures on silicon substrate.

Info:

Periodical:

Advanced Materials Research (Volumes 211-212)

Edited by:

Ran Chen

Pages:

1105-1109

DOI:

10.4028/www.scientific.net/AMR.211-212.1105

Citation:

X. Q. Fan "Realization of Three-Dimensional Nanostructure Fabrication by Nanoimprint on Silicon Substrate", Advanced Materials Research, Vols. 211-212, pp. 1105-1109, 2011

Online since:

February 2011

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$35.00

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