Experimental Study on the Precision Lapping of Sapphire Substrate

Xiao Wang; Cong Da Lu; Dong Hui Wen

doi:10.4028/www.scientific.net/AMR.215.291

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Experimental Study on the Precision Lapping of Sapphire Substrate
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 215Experimental Study on the Precision Lapping of...

Experimental Study on the Precision Lapping of Sapphire Substrate

Abstract:

Experimental research on the surface quality parameters such as roughness and removal rate in the precision lapping of sapphire was promoted in this paper, effects of processing parameters as load, speed of rotation, grain size and density on sapphire surface quality was studied by experiments. Results showed that lapping load and rotate speed were the most important factors on the removal rate, grain size played a key role in the removal rate and roughness under the same conditions, profile tolerance of surface shape depends on the flatness.

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Periodical:

Advanced Materials Research (Volume 215)

Pages:

291-294

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.215.291

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Online since:

March 2011

Authors:

Xiao Wang, Cong Da Lu, Dong Hui Wen

Keywords:

Experimental Study, Precise Lapping, Roughness, Sapphire

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