Structure and Tribological Behaviors of Synthetic MoS2 Film Prepared by a Novel Compound Method

Li Na Zhu; Cheng Biao Wang; Hai Dou Wang; Bin Shi Xu; Jia Jun Liu; Guo Lu Li

doi:10.4028/www.scientific.net/AMR.217-218.1102

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 217-218Structure and Tribological Behaviors of Synthetic...

Structure and Tribological Behaviors of Synthetic MoS₂ Film Prepared by a Novel Compound Method

Abstract:

In this paper, the structure and tribological properties of synthetic MoS2 film prepared by a novel compound technology—combining magnetron sputtering with low temperature ion sulfurizing were investigated. X-ray diffraction (XRD) pattern for the MoS2 film implies that the film mainly consists of Mo and MoS2 phases. The hardness of the synthetic MoS2 film was 7.44 GPa which was higher than that of the FeS film. The sliding tribological behavior of the MoS2 film was studied by ball-on-disc tests. The results showed that the synthetic MoS2 film possessed excellent friction-reducing and wear-resisting properties. In addition, the tribological behaviors of the MoS2 film were superior to those of the FeS film and original 1045 steel.

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Periodical:

Advanced Materials Research (Volumes 217-218)

Pages:

1102-1107

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.217-218.1102

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Online since:

March 2011

Authors:

Li Na Zhu, Cheng Biao Wang, Hai Dou Wang, Bin Shi Xu, Jia Jun Liu, Guo Lu Li

Keywords:

Low Temperature Ion Sulfurizing, Magnetron Sputtering, Structure, Synthetic MoS₂ Film, Tribological Behaviour

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