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Study on the Properties of DSM SOMOS 11120 Type Photosensitive Resin for Stereolithography Materials

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Abstract:

DSM SOMOS 11120 type photosensitive resin possessed the biggest consumption for the stereolithography fabricated parts. Therefore the further research on DSM SOMOS 11120 type photosensitive resin was very meaningful and valuable. In the paper, DSM SOMOS 11120 type photosensitive resin was characterized by infrared (IR) and nuclear magnetic resonance (NMR) spectroscopy, showing the presence of epoxy and acrylic functional groups. The viscosity of the 11120 type photosensitive resin were also determined, indicating that the viscosity at 30°C was 260mPa.s. Meanwhile, the mechanical and thermal properties of its UV-cured specimens were evaluated, testing that the tensile strength was 50.8MPa, the tensile modulus was 2659MPa, the elongation at break was 11.3%, and the glass transistion temperature was 49°C.

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Periodical:

Advanced Materials Research (Volumes 233-235)

Pages:

194-197

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.233-235.194

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Cite this paper

Online since:

May 2011

Authors:

Bi Wu Huang, Zi Xiang Weng, Wei Sun

Keywords:

Critical Exposure, Laser, Penetration Depth, Photosensitive Resin, Stereolithography

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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