A Study on the Process of ZnO Thin Films Prepared by Ion Beam Sputtering

Abstract:

Based on the ion beam sputtering deposition technology, we adopted the reactive sputtering deposition method to accomplish the coating on the glass substrata with ZnO thin films. We used the four-factor and three-level L₉(3⁴) orthogonal experiment to obtain the best technological parameters of deposited ZnO thin films: discharge voltage 3.5KV, oxygen current capacity 8SCCM, the coil current 8A, the distance between target and substrata 140mm. The purity of the deposited ZnO thin film is 85.77%, and it has the good crystallization in orientation. The experimental results show that research and development of the ion beam sputtering source is advanced and has a good application value, and the ion beam sputtering deposition technology can be used to deposit the preferred orientation thin films with good performance. The findings have provided the experimental result and the beneficial reference for the ion beam sputtering deposition research.

• Periodical: Advanced Materials Research (Volumes 233-235)
• Pages: 2399-2402
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.233-235.2399
• Online since: May 2011
• Authors: Shen Jiang Wu, Wei Shi, Jun Hong Su, Wen Qi Wang
• Keywords: Ion Beam Sputtering Deposition (IBSD), Preferred Orientation, ZnO Thin Film

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