Effect of Thickness on GLAD TiO2 Thin Films with Incline Spinning Substrate on Rotating Holder (ISSRH) Technique

Abstract:

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The report presents the effects of the thickness on the TiO2 thin films prepared by the GLAD technique with incline spinning substrate on rotating holder (ISSRH) by using the electron beam evaporation. The prepared films were heated at 500 °C for 2 hr in air. The microstructure of films was investigated by UV- visible photometer, X-ray diffraction, XRD and field emission scanning electron microscope, FE-SEM. The results showed the thickness of 10, 50, 100 and 300 nm films exhibited continuity distribution of the crystalline. The crystalline structure evidenced the dominant peak at the 300 nm thickness. GLAD TiO2 films exhibited the columnar growth and porosity. The TiO2 nanostructures showed rutile phase.

Info:

Periodical:

Advanced Materials Research (Volumes 236-238)

Edited by:

Zhong Cao, Yinghe He, Lixian Sun and Xueqiang Cao

Pages:

3024-3027

DOI:

10.4028/www.scientific.net/AMR.236-238.3024

Citation:

V. Mekla et al., "Effect of Thickness on GLAD TiO2 Thin Films with Incline Spinning Substrate on Rotating Holder (ISSRH) Technique", Advanced Materials Research, Vols. 236-238, pp. 3024-3027, 2011

Online since:

May 2011

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Price:

$35.00

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