Effect of Thickness on GLAD TiO2 Thin Films with Incline Spinning Substrate on Rotating Holder (ISSRH) Technique

Vatcharinkorn Mekla; Supakorn Pukird; Supanit Porntheerapat; Jiti Nukeaw

doi:10.4028/www.scientific.net/AMR.236-238.3024

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 236-238Effect of Thickness on GLAD TiO2 Thin Films with...

Effect of Thickness on GLAD TiO₂ Thin Films with Incline Spinning Substrate on Rotating Holder (ISSRH) Technique

Abstract:

The report presents the effects of the thickness on the TiO₂ thin films prepared by the GLAD technique with incline spinning substrate on rotating holder (ISSRH) by using the electron beam evaporation. The prepared films were heated at 500 °C for 2 hr in air. The microstructure of films was investigated by UV- visible photometer, X-ray diffraction, XRD and field emission scanning electron microscope, FE-SEM. The results showed the thickness of 10, 50, 100 and 300 nm films exhibited continuity distribution of the crystalline. The crystalline structure evidenced the dominant peak at the 300 nm thickness. GLAD TiO₂ films exhibited the columnar growth and porosity. The TiO₂ nanostructures showed rutile phase.

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Periodical:

Advanced Materials Research (Volumes 236-238)

Pages:

3024-3027

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.236-238.3024

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Online since:

May 2011

Authors:

Vatcharinkorn Mekla, Supakorn Pukird, Supanit Porntheerapat, Jiti Nukeaw

Keywords:

Electron Beam Evaporation, Glad, ISSRH, Microstructure, Rutile, TiO₂

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