A Theoretical Analysis of the Fracture Behavior of a Multi-Layered Thin Film Structure under Residual Tensile Stress

Abstract:

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In this work, the fracture behavior of a multi-layered thin film structure under residual tensile stress is investigated theoretically. Using composite material theory and a modified shear-lag model, the analytical solutions for the distribution laws of the tensile stress developed in the first-layer thin film and the shear stress developed along the interface can be obtained. In addition, the crack density of the first-layer thin film can be derived from the residual stress and the mechanical and geometric parameters of the cracked system. This result also yields a measurement of the residual stress from the crack density and the mechanical and geometric parameters of the system. Finally, a numerical example is presented to show how the crack density varies versus the residual stress.

Info:

Periodical:

Advanced Materials Research (Volumes 239-242)

Edited by:

Zhong Cao, Xueqiang Cao, Lixian Sun, Yinghe He

Pages:

2179-2182

DOI:

10.4028/www.scientific.net/AMR.239-242.2179

Citation:

B. Q. Yang and F. X. Li, "A Theoretical Analysis of the Fracture Behavior of a Multi-Layered Thin Film Structure under Residual Tensile Stress", Advanced Materials Research, Vols. 239-242, pp. 2179-2182, 2011

Online since:

May 2011

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$35.00

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