Electrochemical Characteristics of Osteoblast Cultured Ti-Ta Alloy for Dental Implant

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Periodical:

Advanced Materials Research (Volumes 26-28)

Edited by:

Young Won Chang, Nack J. Kim and Chong Soo Lee

Pages:

821-824

DOI:

10.4028/www.scientific.net/AMR.26-28.821

Citation:

W. G. Kim et al., "Electrochemical Characteristics of Osteoblast Cultured Ti-Ta Alloy for Dental Implant", Advanced Materials Research, Vols. 26-28, pp. 821-824, 2007

Online since:

October 2007

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$35.00

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