Gas Barrier Properties of SiO_X Films Deposited by RF Magnetron Co-Sputtering

Abstract:

SiO_x barrier films were deposited on poly (ethylene terephthalate) (PET) by radio frequency (RF) magnetron co-sputtering with double targets. The films deposited by co-sputtering were denser and smoother because different energy particles sputtering from double targets grew small islands to weaken shadowing effect which greatly reduce the interval gaps. The water vapor and oxygen transmission of SiO_x films deposited by co-sputtering decreased to 0.31 cc/m²/day, 0.27 g/m²/24h respectively.

• Periodical: Advanced Materials Research (Volumes 284-286)
• Pages: 48-52
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.284-286.48
• Online since: July 2011
• Authors: Zhuang Liu, Lin Zhu, Jing Lin, Zhi Hui Sun
• Keywords: Barrier, Co-Sputtering, Silicon Oxide

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