Gas Barrier Properties of SiOX Films Deposited by RF Magnetron Co-Sputtering

Abstract:

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SiOx barrier films were deposited on poly (ethylene terephthalate) (PET) by radio frequency (RF) magnetron co-sputtering with double targets. The films deposited by co-sputtering were denser and smoother because different energy particles sputtering from double targets grew small islands to weaken shadowing effect which greatly reduce the interval gaps. The water vapor and oxygen transmission of SiOx films deposited by co-sputtering decreased to 0.31 cc/m2/day, 0.27 g/m2/24h respectively.

Info:

Periodical:

Advanced Materials Research (Volumes 284-286)

Main Theme:

Edited by:

Xiaoming Sang, Pengcheng Wang, Liqun Ai, Yungang Li and Jinglong Bu

Pages:

48-52

DOI:

10.4028/www.scientific.net/AMR.284-286.48

Citation:

Z. Liu et al., "Gas Barrier Properties of SiOX Films Deposited by RF Magnetron Co-Sputtering", Advanced Materials Research, Vols. 284-286, pp. 48-52, 2011

Online since:

July 2011

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$35.00

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