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Influence of Treatment of Hydrogen Plasma on Field Emission Properties of Carbon Nanotubes Films

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Abstract:

Carbon nanotubes(CNTs) films were fabricated by microwave plasma chemical vapor deposition (MPCVD) on stainless steel substrates. In order to study the reason that its emission current weakens, the CNTs films were treated by hydrogen plasma. The research discovered that the hydrogen plasma treatment to the carbon nanotubes films reduced the surface work function of the film and its filed emission current, this mainly due to the etching of hydrogen plasma to sp2 carbon on the surface, it leads emission area to decrease.

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Periodical:

Advanced Materials Research (Volumes 306-307)

Pages:

1170-1173

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.306-307.1170

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Online since:

August 2011

Authors:

Zhi Qin Fan, Hai Feng Ou, Rui Li, Gen Wang Cai, Jun De Zhang

Keywords:

Carbon Nanotube (CN), Field Emission, MPCVD

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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