Fabrication and Electrical Properties of P(VDF-TrFE)/Bi3.5Nd0.5Ti3O12 Bi-Layer Composite Ferroelectric Thin Films

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The microstructure and electrical properties of P(VDF-TrFE)/Bi3.5Nd0.5Ti3O12 bi-layer composite ferroelectric thin films deposited on Pt/Ti/SiO2/Si using two successive spin coatings were investigated. It shows the pores in Bi3.5Nd0.5Ti3O12 (BNT) films were effectively suppressed by the presence of P(VDF-TrFE) copolymer films by SEM. The ferroelectric, leakage and dielectric properties of the thin films with different thickness ratio of P(VDF-TrFE) and BNT thin films were measured. With increasing the thickness of P(VDF-TrFE), the remnant polarization, coercive electric field, leakage current density and dielectric constant of thin films were all decreased (except pure P(VDF-TrFE) thin film). Results indicate that the key electrical properties were improved effectively by a little loss of the remnant polarization, which infers potential application in the filed of ferroelectric memory.

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170-175

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August 2011

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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[1] J.F. Scott and C.A. Paz de Araujo: Science Vol. 246 (1989), p.1400.

Google Scholar

[2] C.H. Ahn, T. Tybell, L. Antognazza, K. Char, et al.: Science Vol. 276 (1997), p.1100.

Google Scholar

[3] B.H. Park, B.S. Kang, S.D. Bu, et al.: Nature Vol. 401 (1999), p.682.

Google Scholar

[4] Z. Ye, M.H. Tang, Y.C. Zhou, et al.: Appl. Phys. Lett. Vol. 90 (2007), p.082905.

Google Scholar

[5] A.Z. Simões, C.S. Riccardi, L.S. Cavalcante, et al.: Mater. Res. Bull. Vol. 43 (2008), p.158.

Google Scholar

[6] K. Yamamoto, Y. Kitanaka, M. Suzuki, et al.: Appl. Phys. Lett. Vol. 91 (2007) p.162909.

Google Scholar

[7] X.L. Zhong, B. Li, J.B. Wang, et al.: Materials. Lett. Vol. 62 (2008), p.2891.

Google Scholar

[8] M.H. Tang, Y.C. Zhou, X.J. Zheng, et al.: Solid State Electronics Vol. 51 (2007), p.371.

Google Scholar

[9] J.R. Cheng and Z.Y. Meng: Thin Solid Films Vol. 385 (2001), p.5.

Google Scholar

[10] B. Jiang, Y. Bai , J.L. Cao, et al.: J. Appl. Phys. Vol. 103 (2008), p.116102.

Google Scholar

[11] D.Y. Guo, M.Y. Li , J. Wang, et al.: Appl. Phys. Lett. Vol. 91 (2007), p.232905.

Google Scholar

[12] M.A. Mohiddon and K.L. Yadav: J. Appl. Phys. Vol. 101 (2007), p.094101.

Google Scholar

[13] P. Sun, N. Matsuura and H.E. Ruda: J. Appl. Phys. Vol. 96 (2004), p.063417.

Google Scholar

[14] A.J. Lovinger: Science Vol. 220 (1983), p.1115.

Google Scholar

[15] G.H. Gelinck, A.W. Marsman, F.J. Touwslager, et al.: Appl. Phys. Lett. Vol. 87 (2004), p. (2032).

Google Scholar

[16] Y.J. Park, H.J. Jeong, J.Y. Chang, et al.: J. Semicond. Sci. Technol., VOL. 8 (2008), p.51.

Google Scholar

[17] S. Ducharme, T. J. Reece, C. M. Othon, et al.: IEEE T. Device Mat. Re. Vol. 5 (2005), p.720.

Google Scholar

[18] X.X. Wang, K.H. Lam, X.G. Tang, et al.: Solid State Commun. Vol. 130 (2004), p.695.

Google Scholar

[19] M. Dietze and M. Es-Souni: Sensors and Actuators A Vol. 143 (2008), p.329.

Google Scholar