Influence of Abrasive on Planarization Grinding Based on the Cluster Magnetorheological Effect

Abstract:

A new planarization grinding method based on the cluster magnetorheological (MR) effect is presented to grind optical glass in this paper. Some process experiments were conducted to reveal the influence of the species and granularity and content of the abrasive materials in the MR fluid on the machining effect, furthermore, the machining characteristic of grinded surface was studied. The results indicate that the abrasive influences definitively on machining effect of this planarization grinding method based on the cluster MR-effect. Under the certain experiment condition, with the content of the abrasive 10% and grain size 800# of SiC, best machining effect can be achieved. The difference species of abrasive results in various machining effects. As for the removal rate of K9 optical glass: abrasive CeO2 is the best, the Al2O₃ is the second and the SiC is the worst. While the surface roughness: abrasive SiC is the lowest，the Al2O₃ is the second and CeO2 is the highest.

• Periodical: Advanced Materials Research (Volume 325)
• Pages: 542-547
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.325.542
• Online since: August 2011
• Authors: Qiu Sheng Yan, Jie Wen Yan, Jia Bin Lu, Wei Qiang Gao, Min Li
• Keywords: Abrasive, Cluster MR-Effect, Planarization Grinding

References

[1] J.H. Jan, F. Jiao. Progresses and trends in research on ultra-precision machining technology[J]. Mechanical research and application, Vol. 3. (2009), p.4.

[2] Z.J. Yuan. Latest Developments of Precision Manufacturing Technology at Home and Abroad. Tool Engineering. Vol. 42 (2008), p.5.

[3] J.D. Yang: High Speed Grinding Technique. (National Defense Industry Press, China 2003).

[4] Q.S. Yan, A.J. Tang, J.B. Lu and W.Q. Gao. Development of a New Plate Polishing Technique with an Instantaneous Tiny-grinding Wheel Cluster Based on Magnetorheological Effect. Advanced Materials Research, Vols. 53-54(2008), p.155.

DOI: 10.4028/www.scientific.net/amr.53-54.155

[5] J.W. Yan, Q.S. Yan, J.B. Lu and W.Q. Gao. Influence of Magnetic Field Strength on Polishing Effect of the Tiny-Grinding Wheel Cluster Based on the Magnetorheological Effect. Key Engineering Materials, Vol. 443(2010), p.406.

DOI: 10.4028/www.scientific.net/kem.443.406

[6] P.Z. Zhang, H. Lei, J.P. Zhang etc. Preparation of Nano-sized CeO2 and its Polishing Performances. Optical Technique, Vol. 32(2006), p.682.

[7] J. Li, X.B. He, Z.Y. Gu etc. Preparation of Ultra-fine CeO2 Precursor for Optical Glass Polishing Material. Rare Metals and Cemented Carbides, Vol. 31(2003), p.1.