Design and Analysis of a MEMS Tunable Inductor Based on UV Lithography of SU-8

Abstract:

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This paper reports the design of a tunable radio-frequency (RF) inductor and analyses the parameters that influence the quality factor (Q) of the inductor. In our paper we mainly discuss the influence of the thickness of the metal layer on the Q when other parameters are fixed. In order to achieve the high thickness, we use SU-8 as our photoresist instead of the traditional photoresist. Through the analysis, we calculate out the thickness of the metal layer is 23um when the Q reaches to maximum.

Info:

Periodical:

Advanced Materials Research (Volumes 341-342)

Edited by:

Liu Guiping

Pages:

36-41

DOI:

10.4028/www.scientific.net/AMR.341-342.36

Citation:

X. H. Li et al., "Design and Analysis of a MEMS Tunable Inductor Based on UV Lithography of SU-8", Advanced Materials Research, Vols. 341-342, pp. 36-41, 2012

Online since:

September 2011

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Price:

$35.00

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