Design and Analysis of a MEMS Tunable Inductor Based on UV Lithography of SU-8

Xiang Hong Li; Jian Lin Liu; Bin Zhen Zhang; Xiang Jiao Meng; Chang Hong Ji

doi:10.4028/www.scientific.net/AMR.341-342.36

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 341-342Design and Analysis of a MEMS Tunable Inductor...

Design and Analysis of a MEMS Tunable Inductor Based on UV Lithography of SU-8

Abstract:

This paper reports the design of a tunable radio-frequency (RF) inductor and analyses the parameters that influence the quality factor (Q) of the inductor. In our paper we mainly discuss the influence of the thickness of the metal layer on the Q when other parameters are fixed. In order to achieve the high thickness, we use SU-8 as our photoresist instead of the traditional photoresist. Through the analysis, we calculate out the thickness of the metal layer is 23um when the Q reaches to maximum.

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Periodical:

Advanced Materials Research (Volumes 341-342)

Pages:

36-41

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.341-342.36

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Online since:

September 2011

Authors:

Xiang Hong Li, Jian Lin Liu, Bin Zhen Zhang, Xiang Jiao Meng, Chang Hong Ji

Keywords:

Inductor, Quality Factor (Q), SU-8, UV Lithography

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References

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