Fabrication of Nanopit Array Using Electron Beam Lithography

Alsadat Rad Maryam; Kamarulazizi Ibrahim

doi:10.4028/www.scientific.net/AMR.364.169

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Fabrication of Nanopit Array Using Electron Beam Lithography
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 364Fabrication of Nanopit Array Using Electron Beam...

Fabrication of Nanopit Array Using Electron Beam Lithography

Abstract:

This work reported the fabrication of nanopits array pattern using electron beam lithography (EBL). The effects of electron dosage on pattern shape were evaluated through EBL with a positive resist, Poly Methyl Meth Acrylate (PMMA), under acceleration voltages of 20 and 30 kV. Pattern of nanopits with 200 nm diameter have been created on PMMA to investigate the effect of various electron beam doses. The SEM images have shown effect of the voltage and dosage variation on them. In addition, Monte Carlo simulation has been done to show the scattering of electrons and proximity effect at different voltages in PMMA in order to explain the experimental results.

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Periodical:

Advanced Materials Research (Volume 364)

Pages:

169-173

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.364.169

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Online since:

October 2011

Authors:

Alsadat Rad Maryam, Kamarulazizi Ibrahim

Keywords:

Electron Beam Dosage, Electron Beam Lithography, Monte Carlo, Nano-Pit

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