Seed-Mediated Liquid Phase Deposition Method for TiO2 Nanostructure Growth on ITO Substrate: Effect of Surfactant

Liszulfah Roza; Akrajas Ali Umar; Mohd Yusri Abd Rahman; Muhamad Mat Salleh

doi:10.4028/www.scientific.net/AMR.364.393

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 364Seed-Mediated Liquid Phase Deposition Method for...

Seed-Mediated Liquid Phase Deposition Method for TiO₂ Nanostructure Growth on ITO Substrate: Effect of Surfactant

Abstract:

This paper reports the study on the effect of the surfactants, cetyltrimethylammonium bromide (CTAB) and hexamethylenetetramine (HMT) on the growth of TiO₂ nanostructures on ITO surface. TiO₂ nanostructures were prepared using a seed-mediated liquid phase deposition (LPD) method. LPD is an electrolysis deposition of metal oxide via hydrolysis of metal-fluoro complex in the presence of boric acid at ambient temperature. In typical case, this method allows the formation of metal oxide film on the substrate surface. Since the properties strongly depend on shape at this length scale, the morphology control growth of TiO₂ nanostructures is highly demanded in order to produce desired properties in application. In this work we demonstrate the growth of wire like structure of TiO₂(instead of film) on ITO surface via a seed-mediated liquid phase deposition in the present of surfactant. In typical result, TiO₂ with diameter ca. 40 nm at the bottom of nanowire to ca. 10 nm at the nanowire tip can be successfully grown on the surface. The effect of surfactant and their concentration on the growth characteristics of TiO₂nanostructure will be discussed.

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Advanced Materials Research (Volume 364)

Pages:

393-397

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.364.393

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Online since:

October 2011

Authors:

Liszulfah Roza, Akrajas Ali Umar, Mohd Yusri Abd Rahman, Muhamad Mat Salleh

Keywords:

Liquid Phase Deposition (LPD), Surfactant, TiO₂Nanostructure

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