Influence of Body Contact on the ESD Protection Performance in 0.35μm Partially-Depleted SOI Salicided CMOS Technology

Article Preview

Abstract:

Although body contact can solve the problem of floating body effect in the partially-depleted (PD) SOI technology, it still has important influence on the ESD protection performance. In order to investigate the influence of body contact on the ESD protection performance, three different structures are fabricated in 0.35μm PD SOI salicided CMOS technology, they are stick gate structure with body floating, H gate structure with body contact located outside the edge gate, and body tied source (BTS)structure with body contact placed intermittently along the source diffusion. The transmission line pulse generator(TLPG) measured results of these three different structures are compared and analyzed, both the stick gate structure with body floating and BTS structure have a better robustness level than H gate structure with body contact.

You might also be interested in these eBooks

Info:

Periodical:

Advanced Materials Research (Volumes 383-390)

Pages:

7025-7031

Citation:

Online since:

November 2011

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2012 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] Jean-Pierre Colinge. Silicon-on-Insulator Technology: Materials to VLSI, 3rd Edition. Norwell, Massachusetts, USA: Kluwer Academic Publishers, (2004).

Google Scholar

[2] D. Greenlaw, G. Burbach, T. Feudel, F. Feustel, K. Frohberg, et al. Taking SOI substrates and low-k dielectrics into high-volume microprocessor production, " IEDM , 03 Technical Digest, IEEE Press, Dec. 2003, p.11.

DOI: 10.1109/iedm.2003.1269278

Google Scholar

[3] R. Bolam, G. Shahidi, F. Assaderaghi, M. Khare, A. Mocuta, et al. Reliability issues for silicon-on-insulator, " IEDM , 00 Technical Digest, IEEE Press, Dec. 2000, pp.131-134, doi: 10. 1109/IEDM. 2000. 904275.

DOI: 10.1109/iedm.2000.904275

Google Scholar

[4] Eugene Zhao, John Zhang, Akram Salman, Niraj Subba, Jay Chan, et al. Reliability challenges of high performance PD SOI CMOS with ultra-thin gate dielectrics, 2003 International Semiconductor Device Research Symposium, IEEE Press, Dec. 2003, pp.357-358.

DOI: 10.1109/isdrs.2003.1272134

Google Scholar

[5] M. Yoshimi, M. Terauchi, A. Nishiyama, O. Arisumi, A. Murakoshi, et al. Suppression of the floating-body effect in SOI MOSFET's by the bandgap engineering method using a Si1-x Gex source structure, IEEE Transactions on Electron Devices, Vol. 44, Mar. 1997 pp.423-430.

DOI: 10.1109/16.556152

Google Scholar

[6] M. Horiuchi and M. Tamura. BESS: a source structure that fully suppresses the floating body effect in SOI CMOSFET's, IEEE Transactions on Electron Devices, Vol. 45, May 1998, pp.1077-1083, doi: 10. 1109/16. 669536.

DOI: 10.1109/16.669536

Google Scholar

[7] A. Nishiyama, O. Arisumi, M. Yoshimi. Suppression of the floating body effect in partially-depleted SOI MOSFET's with SiGe source structure and its mechanisms, IEEE Transactions on Electron Devices, Vol. 44, Dec. 1997, pp.2187-2191.

DOI: 10.1109/16.644634

Google Scholar

[8] D. Chang, S. Veeraraghavan, M. Mendicino, M. Rashed, D. Connelly, et al. Efficacy of Ar in reducing the kink effect on floating body NFD/SOI CMOS, 1998 IEEE International SOI Conference, Oct. 1998, pp.155-156, doi: 10. 1109/SOI. 1998. 723158.

DOI: 10.1109/soi.1998.723158

Google Scholar

[9] Xiaowu Cai and Chaohe Hai. Study of body contact of partial depleted SOI NMOS devices, 2006 8th International Conference on Solid-State and Integrated Circuit Technology, IEEE Press, Oct. 2006, pp.212-214, doi: 10. 1109/ICSICT. 2006. 306164.

DOI: 10.1109/icsict.2006.306164

Google Scholar

[10] J. Sleight and K. Mistry. A compact schottky body contact technology for SOI transistors, " IEDM , 97 Technical Digest, IEEE Press, Dec. 1997, pp.419-422, doi: 10. 1109/IEDM. 1997. 650414.

DOI: 10.1109/iedm.1997.650414

Google Scholar

[11] J. Damiano and P. D. Franzon. Integrated dynamic body contact for H-gate PD-SOI MOSFETs for high performance/low power, 2004 IEEE International SOI Conference, Oct. 2004, pp.115-116.

DOI: 10.1109/soi.2004.1391580

Google Scholar

[12] LI Rui-zhen and HAN Zheng-sheng. Novel BTS structure technology for partially depleted SOI MOSFET, Chinese Journal of Electron Device, Vol. 28, Dec. 2005, pp.730-732.

Google Scholar

[13] ZHAO Hongchen, HAI chaohe, Han Zhengsheng and QIAN He. Radiation of SOI MOSFET with shallow source, Chinese Journal of Electron Device, Vol. 25, June 2004, pp.735-740.

Google Scholar

[14] Y. Fukuda, T. Yamada, M. Sawada. ESD parameter extraction by TLP measurement, 2009 31st EOS/ESD Symposium, Aug. 2009, pp.1-6.

Google Scholar