[1]
D. C. Cole, E. Earouch, E. W. Conrad, and M. Yeung, Using advanced simulation to aid microlithography development, Proc. IEEE, vol. 89, p.1194–1213, Aug. (2001).
DOI: 10.1109/5.940288
Google Scholar
[2]
J. A. Sethian, , A Fast Marching Level Set Method for Monotonically Advancing Fronts, Proc. Natl. Acad. Sci., vol. 93, p.1591–1595; Feb. (1996).
DOI: 10.1073/pnas.93.4.1591
Google Scholar
[3]
S. Osher, J. A. Sethian, Fronts Propagating with Curvature Dependent Speed: Algorithms Based on the Hamilton-Jacobi Formulation, J. Comput. Phys., vol. 79, p.12–49, (1988).
DOI: 10.1016/0021-9991(88)90002-2
Google Scholar
[4]
D. Adalsteinsson and J. A. Sethian, A Level Set Approach to a Unified Model For Etching, Deposition and Lithography I: Algorithms And Two-Dimensional Simulations, J. Comput. Phys., vol. 120, p.128–144, (1995).
DOI: 10.1006/jcph.1995.1153
Google Scholar
[5]
D. Adalsteinsson and J. A. Sethian, A Level Set Approach to a Unified Model For Etching, Deposition and Lithography II: Three-Dimensional Simulations, J. Comput. Phys., vol. 122, p.348–366, (1995).
DOI: 10.1006/jcph.1995.1221
Google Scholar
[6]
J. A. Sethian, and D. Adalsteinsson, An overview of Level Set Methods for Etching, Deposition, and Lithography, IEEE Trans. Semi. Manu., vol. 10, Feb. (1997).
DOI: 10.1109/66.554505
Google Scholar
[7]
E. Rouy and A. Tourin, A Viscosity Solutions Approach to Shape-From-Shading, SIAM J. Num. Anal., vol. 29, p.867–884, (1992).
DOI: 10.1137/0729053
Google Scholar
[8]
J. A. Sethian, Fast Marching Level-Set Methods For Three-Dimensional Photolithography Development, Proc. SPIE, vol. 2726 p.262–272, (1996).
DOI: 10.1117/12.240962
Google Scholar
[9]
Z. F. Zhou, Q. A. Huang, W. H. Li, and W. Lu, A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching Process Simulation, IEEE Trans. Computer-Aided Des. of Integrated Cir. and Sys., vol. 26, Jan. (2007).
DOI: 10.1109/tcad.2006.882510
Google Scholar
