A New Approach for Colloidal Crystal Fabrication with the Template of Reversible Stress Wrinkle

Qing Xu; Zhao Ting Yang; Chao Rong Li; Ben Yong Chen; Wen Jun Dong

doi:10.4028/www.scientific.net/AMR.418-420.651

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 418-420A New Approach for Colloidal Crystal Fabrication...

A New Approach for Colloidal Crystal Fabrication with the Template of Reversible Stress Wrinkle

Abstract:

Wrinkle is a favorable template for patterning cells or particles. A new approach is developed to control and fabricate PS colloidal crystals with the reversible wrinkle on PDMS substrate/Pt film stressed system. The obtained structure is characterized by optical microscope and scanning electron microscope. It demonstrates that the settlement of colloids can be regulated by the buckling wavelength which can be tuned by varying the film thickness and substrate mixture mass ratio. Compared with monolayer PS film patterned on herringbones pattern wrinkle, the film on stripes pattern wrinkle always has low defect rate. It is meaningful for fabricating large-scale regular spacing and high-ordered PS colloid films.

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Materials Processing Technology, ICAMMP2011

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Periodical:

Advanced Materials Research (Volumes 418-420)

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651-655

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.418-420.651

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Online since:

December 2011

Authors:

Qing Xu, Zhao Ting Yang, Chao Rong Li, Ben Yong Chen, Wen Jun Dong

Keywords:

Monolayer Film, PS Beads Assemble, Reversible Wrinkle, Wavelength

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