Additive-Effects on the Morphological and Structural Characteristics of Matt Tin Electrodeposits from a Methansulfonate Acid Bath

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The methansulfonate acid electrolyte is a new type of plating baths which has some advantages such as friendly to environment, stability and outstanding electrical conductivity. In this work, the effect of three organic additives (nonionic surfactant Triton X-100, a weak organic acid (additive A) and an organic sodium salt (additive B)) in stannous methanesulfonate baths on tin electrodeposits were studied by SEM and XRD. The results show that the Triton X-100 plays an important role in improving the coating qualities and promoting the densification of crystalline structure. Under the synergetic action of additive A and additive B in the presence of Triton X-100 a smooth, fine-grained matt tin coating which has certain preferred orientations of lattice plane, could be obtained on copper substrate.

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11-14

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February 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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[1] E. Morgan: Tinplate and Modern Canmaking (Pergamon, Oxford,1995).

Google Scholar

[2] Y. D. Gamburg and G. Zangari: Theory and Practice of Metal Electrodeposition (Springer, New York 2011).

Google Scholar

[3] J. long, Z. Zhang, Z. Guo, et al: submitted to Advanced Materials Research (2011)

Google Scholar

[4] L. Oniciu and L. Muresan: J. Appl. Electrochem. Vol.21 (1991), p.565

Google Scholar

[5] E. Budevski, G. Staikov and W.J. Lorenz: Electrochimica Acta Vol.45 (2000), p.2559

DOI: 10.1016/s0013-4686(00)00353-4

Google Scholar

[6] V.M. Kozlov, B.L. Peraldo and V.N. Timoshenko: J. Crystal Growth Vol.183 (1998), p.456

Google Scholar

[7] A. Gomes and M.I.da S. Pereira: Electrochimica Acta Vol.51 (2006), p.1342

Google Scholar

[8] V.M. Kozlov and B.L. Peraldo: Materials Chemistry and Physics Vol.62 (2000), p.158

Google Scholar

[9] V.M. Kozlov and B.L. Peraldo: J. Crystal Growth Vol.203 (1999), p.255

Google Scholar

[10] L. Guo and P.C. Searson: Electrochimica Acta Vol. 55 (2010), p.4086

Google Scholar

[11] J. Amblard, I. Epelboin, M. Froment, et al: J. Appl. Electrochem. Vol.9 (1979), p.233

Google Scholar