Macroporous Silicon Fabricated by HF Electrochemical Etching for Antireflective Application in Solar Cells

Wei Ying Ou; Lei Zhao; Zhao Chen Li; Hong Wei Diao; Wen Jing Wang

doi:10.4028/www.scientific.net/AMR.463-464.1410

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 463-464Macroporous Silicon Fabricated by HF...

Macroporous Silicon Fabricated by HF Electrochemical Etching for Antireflective Application in Solar Cells

Abstract:

Macroporous silicon was fabricated by electrochemical etching in hydrogen fluoride (HF) electrolyte on P-type silicon wafers. By optimizing the etching condition, the obtained macroporous silicon presented pore diameter of about 2 μm and pore density of ~10⁷/cm². Such macroporous silicon gave out an excellent antireflective performance with the reflectance lower than 4% in a wide spectral range of 400-1000 nm. An a-Si:H/c-Si heterojunction solar cell was fabricated on such macroporous silicon to show its application potential.

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Periodical:

Advanced Materials Research (Volumes 463-464)

Pages:

1410-1414

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.463-464.1410

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Online since:

February 2012

Authors:

Wei Ying Ou, Lei Zhao, Zhao Chen Li, Hong Wei Diao, Wen Jing Wang

Keywords:

Electro Chemical Etching, Macroporous Silicon, Solar Cell

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