Fabrication of Nano-Strctures on PEDOT:PSS Film by Nanoimprint Lithography

Abstract:

It is very hard to fabricate nano-strctures on PEDOT:PSS film by conventional Nanoimprint Lithography for its non-thermoplastic property. Here we demonstrated a new nanoimprint process to pattern the PEDOT:PSS film at low temperature and low pressure by adding proper amount of Glycerol into PEDOT:PSS solution and pressing the Si-mold into Glycerol-PEDOT:PSS film under a pressure of 6.2Mpa for 45min at 80°C. We also compared our result to L. Tan and co-workers’. They found that positive replica was left on PEDOT:PSS film after pressing the Si-mold into Glycerol-PEDOT:PSS film under a pressure of 10Kpa for 5min at 80°C, but our work showed negative replica formed. Pressing time maybe is the critical reason to explain the different results. Holding the pressure longer gave the PEDOT:PSS enough time to flow into Si-mold and also gave Glycerol enough time to evaporate so that PEDOT:PSS became strong enough when separated the Si-mold from the PEDOT:PSS film. At last, Roman spectra was measured to confirm adding glycerol to PEDOT:PSS will not influence its molecular structure.

• Periodical: Advanced Materials Research (Volume 465)
• Pages: 287-291
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.465.287
• Online since: February 2012
• Authors: Jian Ying Li, Hao Yu, Juan Juan Wen, Zhi Dong Li, Zhen Cheng Xu, Ya Feng Zhang, Hang Yu, Bing Rui Lu, Ran Liu, Yi Fang Chen
• Keywords: Glycerol, Nanoimprint Lithography, PEDOT:PSS

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